Atomic layer deposition of HfN<sub><i>x</i></sub> films and improving the film performance by annealing under NH<sub>3</sub> atmosphere
نویسندگان
چکیده
Flowchart illustrating how the films are deposited (a) without and (b) with cleaning step, Auger electron spectroscopy depth profile of 15 nm HfN x precleaning before annealing (c) after 900 °C at NH 3 atmosphere.
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ژورنال
عنوان ژورنال: Journal of Materials Chemistry C
سال: 2023
ISSN: ['2050-7526', '2050-7534']
DOI: https://doi.org/10.1039/d2tc03964h